How atomic-layer deposition and hybrid dielectrics are redefining reliability and scaling for AI-era semiconductors.

A pathway for ALD-enhanced materials to be quickly developed and transitioned from lab-scale to commercial production is available for almost any application, for the first time ever. Atomic-level ...

The fabrication of nanoscale devices increasingly relies on techniques that offer atomic‐scale precision, with Atomic Layer Deposition (ALD) and Area-Selective Deposition (ASD) at the forefront. ALD ...

Surface decomposition reactions and growth mechanisms are the key influences on the physicochemical properties of the deposited films. It is therefore essential to fully characterize and understand ...

(Nanowerk News) To make computer chips, technologists around the world rely on atomic layer deposition (ALD), which can create films as fine as one atom thick. Businesses commonly use ALD to make ...

ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...

The term "ALD" was first used around 2000. This technique achieves atomic layer control and conformal deposition through successive, self-limiting surface reactions. It involves introducing chemical ...

A new technical paper titled “Large-area synthesis of high electrical performance MoS 2 by a commercially scalable atomic layer deposition process” by researchers at the University of Southampton, LMU ...

Atomic layer deposition (ALD) has emerged as a critical technique for fabricating ultrathin films with atomic-scale precision. In particular, ruthenium thin films are of great interest in the ...

Researchers in Spain have developed an n-type crystalline silicon solar cell based on vanadium oxide films deposited by atomic layer deposition. The cell showed an open-circuit voltage of 631 mV, a ...

SAN JOSE, Calif.--(BUSINESS WIRE)--AVACO, specializing in the manufacture of sputtering (PVD) vacuum deposition equipment and atomic layer deposition (ALD) equipment, today announced the development ...

With its newly-developed “Spatial ALD” deposition system, Laser Zentrum Hannover can now also uniformly coat complex-shaped optics. The innovative system achieves higher deposition rates than ...